Deposition of zinc oxide by dielectric barrier discharge

Zinc oxide is a potential material for many industries ranging from paints to electronics. This monograph discusses about a new approach to deposit zinc oxide on silicon wafer with an aim to produce transparent conducting oxide layer of a solar cell. This book discusses the theory related to the deposition process and experimental approach along with the associated results. After deposition characterization of the coating which includes state of the art scanning electron microscopy (SEM) and X-ray photo electron spectroscopy (XPS) is presented in the result and discussion section. The literature will give a clear idea to the readers about the associated theory, experiment and characterization of the dielectric barrier assisted zinc oxide thin film deposition. The book also discusses about the future scope of the experiment for those who are interested in further research on this topic.

Autorentext

Muhammad Rakib Mansur, a graduate mechanical engineer who has completed graduation at the end of year 2000 and did masters in 2009. Whose area of research includes material science, deposition methods, characterization techniques, modelling and simulation. At present doing research in Swinburne University of Technology, Australia, to obtain PhD.