POLYSULFONES AS X-RAY RESISTS

The microlithographic process, essential in the
fabrication of microdevices, uses high-energy
radiation to transfer a pattern onto a thin film of
polymer resist. Pattern transfer occurs by modifying
the properties (solubility or volatility) of the
polymer film exposed to radiation. Poly(olefin
sulfones) exhibit a high sensitivity to
x-rays, which is a desirable property for polymer
resists used in the microlithographic process. The
potential utility of these new resins prompted a
study of the mechanism of degradation promoted by x-
ray radiation. In this study, the effect of x-ray
radiation on polysulfones with varied chemical
structures was analyzed using x-ray absorption near-
edge structure (XANES) spectroscopy and in-situ mass
spectroscopy (MS). Interesting differences in the
mode of degradation of certain poly(olefin sulfones)
was observed. The results provide important
groundwork for further studies of polysulfones as x-
ray resists.

Autorentext

Gina graduated from Louisiana State University with a B.S. in Microbiology in 1995 and a M.S. in Chemistry in 2002. She has worked in the fields of x-ray microlithography, protein crystallography and molecular pharmacology. She is now a Mission Support Scientist at NASA Johnson Space Center since 2007.

Klappentext

The microlithographic process, essential in the fabrication of microdevices, uses high-energy radiation to transfer a pattern onto a thin film of polymer resist. Pattern transfer occurs by modifying the properties (solubility or volatility) of the polymer film exposed to radiation. Poly(olefin sulfones) exhibit a high sensitivity to x-rays, which is a desirable property for polymer resists used in the microlithographic process. The potential utility of these new resins prompted a study of the mechanism of degradation promoted by x-ray radiation. In this study, the effect of x-ray radiation on polysulfones with varied chemical structures was analyzed using x-ray absorption near-edge structure (XANES) spectroscopy and in-situ mass spectroscopy (MS). Interesting differences in the mode of degradation of certain poly(olefin sulfones) was observed. The results provide important groundwork for further studies of polysulfones as x-ray resists.