Thin carbon containing films

The composite materials highly enriched with carbon species attract rapidly growing attention motivated by a wide spectrum of their potential applications. This book describes the detailed investigations concerning processing and stability of thin films including carbon species and their possible application as materials of a low dielectric constant (low-k). In order to gather a complex information regarding the chemical, morphological and dielectric properties of the produced layers a combination of the spectroscopy: X-ray photoelectron spectroscopy (XPS), near edge X-ray absorption fine structure spectroscopy (NEXAFS) and Fourier transform infrared spectroscopy (FTIR), microscopy: atomic force microscopy (AFM) and electrical characterization: capacitance-voltage technique (CV) have been applied.

Autorentext

Master degree in chemistry from the University of Wroclaw, master engineer degree in chemical technology from the Wroclaw University of Technology, chemistry teacher at the private school Sigma in Wroclaw, chemist-analyst at the Wroclaw University of Environmental and Life Sciences, PhD degree from the Brandenburg University of Technology Cottbus.