Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing

The directed *self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing* reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.

Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. ****Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.

Klappentext

The directed *self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing* reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.

Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. ****Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.

Inhalt

Part One: Physics and chemistry of block copolymer (BCP) materials

1: Physics of block copolymers from bulk to thin films

2: RAFT synthesis of block copolymers and their self-assembly properties

3: Thermal and solvent annealing of block copolymer films

4: Field-theoretic simulations and self-consistent field theory for studying block copolymer directed self-assembly

Part Two: Templates and patterning for directed self-assembly

5: Directed self-oriented self-assembly of block copolymers using topographical surfaces

6: Directed self-oriented self-assembly of block copolymers using chemically modified surfaces

7: X-ray characterization of directed self-assembly block copolymers

8: Self-assembly of block copolymers by graphoepitaxy

Part Three: Application of directed self-assembly in nanomanufacturing

9: The inverse directed self-assembly problem

10: Directed self-assembly guiding template design for contact hole patterning

11: Modelling and analysis of large-scale, template self-assembly manufacturing techniques