Fabrication of Free Standing Perforated Membranes
Details
The Current work discusses a novel process developed to fabricate free standing perforated membrane structures in polymers down to sub Micron pore diameter sizes. All parallel patterning processes which combine imprinting technology with micromachining techniques were used. High Aspect Ration Si molds fabricated using DRIE etching and treated with an in house developed anti adhesive coating was used to imprint on SU8 and PMMA Resists. A double layered imprinting technique using a Lift Off Resist as sacrificial layer was developed coupled with thermal imprinting and UV curing to achieve perforated membrane structures having higher mechanical stability than traditional NIL imprint resists like PMMA.
Autorentext
The Author is currently working with IBM India, as a Software Professional. He received his BE Degree in Mechanical Engineering from National Institute of Technology Durgapur, India (Formely REC Durgapur)and his M.S. degree in Mechanical Engineering from Louisiana State University, USA.
Weitere Informationen
- Allgemeine Informationen
- Sprache Englisch
- Gewicht 155g
- Untertitel A Novel Thermal Imprint Approach
- Autor Anish Roychowdhury
- Titel Fabrication of Free Standing Perforated Membranes
- Veröffentlichung 22.05.2010
- ISBN 383836080X
- Format Kartonierter Einband
- EAN 9783838360805
- Jahr 2010
- Größe H220mm x B150mm x T6mm
- Herausgeber LAP LAMBERT Academic Publishing
- Anzahl Seiten 92
- GTIN 09783838360805