Diffusion Characteristics Of Copper In Novel Metallic Films

The goal of this work was to synthesize refractory
materials like TiN, Ta and alloys of TiN-TaN in the
form of thin films which are used as diffusion
barriers in integrated circuits to prevent diffusion
of Cu into the Si substrate. The primary emphasis
of this research was to synthesize different
microstructures of these films like amorphous,
nanocrystalline, textured polycrystalline and single
crystalline films, and to study the effect of these
microstructures on their mechanical and electrical
properties and on diffusion characteristics of Cu.
Microstructures ranging from nanocrystalline to
single crystalline TiN films on Si(100) substrates
were synthesized by Pulsed Laser Deposition
technique by varying the substrate temperature from
25°C to 650°C. Experimental techniques like XRD, TEM,
HRTEM, STEM-Z, EELS, SIMS and four-point probe
resistivity measurement were used for in-depth
analysis. Effect of microstructures of these films
on their mechanical and electrical properties, and
on diffusion behavior of Cu was analyzed.

Autorentext

PhD Thesis at NCSU UniversityDiffusion Characteristics Of Copper In Novel Metallic Films

Klappentext

The goal of this work was to synthesize refractory materials like TiN, Ta and alloys of TiN-TaN in the form of thin films which are used as diffusion barriers in integrated circuits to prevent diffusion of Cu into the Si substrate. The primary emphasisof this research was to synthesize different microstructures of these films like amorphous,nanocrystalline, textured polycrystalline and single crystalline films, and to study the effect of these microstructures on their mechanical and electrical properties and on diffusion characteristics of Cu.Microstructures ranging from nanocrystalline to single crystalline TiN films on Si(100) substrates were synthesized by Pulsed Laser Deposition technique by varying the substrate temperature from 25°C to 650°C. Experimental techniques like XRD, TEM,HRTEM, STEM-Z, EELS, SIMS and four-point probe resistivity measurement were used for in-depth analysis. Effect of microstructures of these films on their mechanical and electrical properties, and on diffusion behavior of Cu was analyzed.