Germanium Surface Preparation Methods

Germanium is gaining interest in the semiconductorindustry as a replacement channel material for highmobility applications. Contamination directlyaffects the device performance, yield andreliability. Therefore, continued device scaling isdependent on effective surface preparation includingeffective contamination and particle removal ofgermanium surface. Cleaning and preparation methodsfor silicon surface have been extensively developedover the past few decades. Germanium surfacecleaning and preparation is at its infancy and ismarkedly different from that of silicon. This bookexamines these differences and fundamentals involvedin germanium surface cleaning. This book alsoproposes methods for basic germanium surfacecleaning and the basis for further processdevelopment for professionals involved in surfacecleaning of semiconductor materials.

Autorentext

Jungyup Kim, Ph.D : Studied Materials Science and Engineering
under Dr. Yoshio Nishi at Stanford University. Experiences
include process engineer at Samsung Electronics.

Klappentext

Germanium is gaining interest in the semiconductor
industry as a replacement channel material for high
mobility applications. Contamination directly
affects the device performance, yield and
reliability. Therefore, continued device scaling is
dependent on effective surface preparation including
effective contamination and particle removal of
germanium surface. Cleaning and preparation methods
for silicon surface have been extensively developed
over the past few decades. Germanium surface
cleaning and preparation is at its infancy and is
markedly different from that of silicon. This book
examines these differences and fundamentals involved
in germanium surface cleaning. This book also
proposes methods for basic germanium surface
cleaning and the basis for further process
development for professionals involved in surface
cleaning of semiconductor materials.