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High Power RF Instrumentation Techniques
CHF 84.00
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5U6KRVPLMM7
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Geliefert zwischen Mo., 17.11.2025 und Di., 18.11.2025
Details
The increasing requirements for semiconductor (smaller geometry/high density) and flat panel/solar panel industry (large surface) are pushing the limits for level and accuracy of RF power delivery. RF instrumentation has to provide essential parameters to accurately (less then 1%) monitor and control the actual plasma impedance and RF power delivered to the plasma. The topics included in this book range from the basic elements of RF instrumentation to advanced signal processing and RF metrology. Absolute accuracy of the RF metrology is compounded by errors introduced by the measurement system, by the chosen calibration method and by power references. RF high power standards are not traceable directly to primary metrology references provided by national standards, therefore the responsibility for the absolute RF power references are in the hands of private companies. The book also has a chapter dedicated to RF high power calibration methods. The present research is intended for students, engineers and designers in the field of plasma generators, lasers exciters, RF heating and lighting, Magnetic Resonance Imaging, cauterization, sterilization and broadcast.
Weitere Informationen
- Allgemeine Informationen
- GTIN 09783836474146
- Genre Technik
- Sprache Deutsch
- Anzahl Seiten 172
- Herausgeber VDM Verlag Dr. Müller e.K.
- Größe H220mm x B220mm
- Jahr 2013
- EAN 9783836474146
- Format Kartonierter Einband (Kt)
- ISBN 978-3-8364-7414-6
- Titel High Power RF Instrumentation Techniques
- Autor Ovidiu Stan
- Untertitel Design Considerations for High Accuracy, High Power RF Instrumentation.
- Gewicht 242g
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