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Ion Beams in Nanoscience and Technology
Details
Energetic ion beam irradiation is the basis of a wide plethora of powerful research- and fabrication-techniques for materials characterization and processing on a nanometre scale. This book will benefit those working in the field.
Includes supplementary material: sn.pub/extras
Inhalt
Trends in nanoscience and technology.- Nanoscale Engineering in the Biosciences.- High Speed Electronics.- Surface Modification Using Reactive Landing of Mass-Selected Ions.- Basic ion-matter interactions in nanometre scale materials.- Basics of Ion Scattering in Nanoscale Materials.- Box 1: Stopping of Ions in Nanomaterials.- Box 2: Sputtering.- Box 3: Ion Ranges.- Computer Simulation Methods for Defect Configurations and Nanoscale Structures.- Characterising Nanoscale Crystal Perfection by Crystal Mapping.- Box 4: Interatomic Potential.- Ion beam characterisation of nanoscale materials.- Medium Energy Ion Scattering for Near Surface Structure and Depth Profiling.- Box 5: Surface Crystallography Terminology.- Thin Film Characterisation Using MeV Ion Beams.- Nanoscale Materials Defect Characterisation.- Box 6: Nanoscale Defects.- Box 7: Diagnostic Ion Beam Luminescence.- Nanomaterials Science with Radioactive Ion Beams.- Nanoscale materials processing with ion beams.- Nanocluster and Nanovoid Formation by Ion Implantation.- Plasma Etching and Integration with Nanoprocessing.- Focused Ion Beam Machining and Deposition.- Box 8: Sample Preparation for Transmission Electron Microscopy Using a Focused Ion Beam.- Box 9: Integrated Circuit Chip Modification Using Focused Ion Beams.- Proton Beam Writing: A New 3D Nanolithographic Technique.- Box 10: Proton Beam Writing of Optical Structures.- Box 11: Tissue Engineering and Bioscience Methods Using Proton Beam Writing.- Box 12: Stamps for Nanoimprint Lithography.- Box 13: Silicon Micro/Nano-Fabrication Using Proton Beam Writing and Electrochemical Etching.- Nanoscale Materials Modification for Device Applications.- Luminescence, Ion Implantation, and Nanoparticles.- Micro- and Nanoengineering with Ion Tracks.- Equipment and practice.- Ion Accelerators for Nanoscience.- Focusing keV and MeV Ion Beams.- Ion Spectrometers and Detectors.- Electronics for Application of Ion Beams in Nanoscience.
Weitere Informationen
- Allgemeine Informationen
- Sprache Englisch
- Anzahl Seiten 484
- Herausgeber Springer Berlin Heidelberg
- Gewicht 975g
- Untertitel Particle Acceleration and Detection
- Titel Ion Beams in Nanoscience and Technology
- Veröffentlichung 18.11.2009
- ISBN 3642006221
- Format Fester Einband
- EAN 9783642006227
- Jahr 2009
- Größe H241mm x B160mm x T35mm
- Lesemotiv Verstehen
- Editor Ragnar Hellborg, Yanwen Zhang, Harry J. Whitlow
- Auflage 2010
- GTIN 09783642006227