Micromirror Technology for Maskless Lithography

This book presents a complete analysis and review of dynamics, control and fabrication of MEMS micromirrors for applications in DUV and EUV maskless lithography. The transient and resonant behavior of various types of electro-mechanically damped micromirrors with various degrees of freedom are discussed. The theoretical approach using the perturbation method and linear control theory is described. Micromirror design and fabrication issues including the material properties, process integration, and device reliability are addressed. Novel processing solutions such as the self-aligned spacer patterning technique to define nano-scale actuation gaps for low-voltage operation are introduced. Fabrication results of highly complicated 3-D MEMS devices such as vertical-comb tilting micromirrors and double-flexure piston micromirrors are demonstrated. This book serves as an excellent in-depth source of MEMS dynamics, control, and fabrication knowledge for both graduate students and experienced researchers.

Autorentext

Yijian Chen received his Ph.D. in EECS from University of California, Berkeley. He is an Associate Professor of Electronic and Computer Engineering in Peking University. He was the recipient of Ross Tucker AIME Electronics Materials Award and SRC Inventor Recognition Award. He has published extensively and holds several US patents.