Nanoimprint Lithography
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T2NLCMMHM28
Geliefert zwischen Mo., 27.10.2025 und Di., 28.10.2025
Details
High Quality Content by WIKIPEDIA articles! High Quality Content by WIKIPEDIA articles! Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.
Weitere Informationen
- Allgemeine Informationen
- GTIN 09786131437342
- Genre Technik
- Editor Lambert M. Surhone, Mariam T. Tennoe, Susan F. Henssonow
- Anzahl Seiten 72
- Herausgeber Betascript Publishing
- EAN 9786131437342
- Titel Nanoimprint Lithography
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