Near-Field Nano-Optics

Conventional optical science and technology have been restricted by the diffraction limit from reducing the sizes of optical and photoruc devices to nanometric dimensions. Thus, the size of optical integrated circuits has been incompatible with that of their counterpart, integrated electronic circuits, which have much smaller dimensions. This book provides potential ideas and methods to overcome this difficulty. Near-field optics has developed very rapidly from around the middle 1980s after preliminary trials in the microwave frequency region, as proposed as early as 1928. At the early stages of this development, most technical efforts were devoted to realizing super-high-resolution optical microscopy beyond the diffraction limit. However, the possibility of exploiting the optical near-field, phenomenon of quasistatic electromagnetic interaction at subwavelength distances between nanometric particles has opened new ways to nanometric optical science and technology, and many applications to nanometric fabrication and manipulation have been proposed and implemented. Building on this historical background, this book describes recent progress in near-field optical science and technology, mainly using research of the author's groups. The title of this book, Near-Field Nano-Optics-From Basic Principles to Nano-Fabrication and Nano-Photonics, implies capabilities of the optical near field not only for imaging/microscopy, but also for fabrication/manipulation/proc essing on a nanometric scale.

Autorentext
Motoiochi Ohtsu was appointed a Research Associate, an Associate professor, a Professor at the Tokyo Institute of Technology. From 1986 to 1987, while on leave from the Tokyo Institute of Technology, he joined the Crawford Hill Laboratory, AT&T Bell Laboratories, Holmdel, NJ. In 2004, he moved to the University of Tokyo as a professor. He has written over 417 papers and received 87 patents. He is the author, co-author, and editor of 55 books, including 22 in English. In 2000, he was appointed as the President of the Tokyo Chapter, LEOS, IEEE. From 2000, He is an executive director of the Japan Society of Applied Physics. His main field of interests is nanophotonics.He is a Fellow of the Optical Society of America, and a Fellow of the Japan Society of Applied Physics. He is also a Tandem Member of the Science Council of Japan. Awards: 14 prizes from academic institutions, including the Distinguished Achievement Award from the Institute of Electronics, Information and Communication Engineering of Japan in 2007, the Julius Springer Prize for Applied Physics in 2009.

Klappentext

The book describes recent progress of near-field optical science and technology. The title of the book implies capabilities of optical near-field not only for imaging/microscopy but also for fabrication/manipulation/processing in nanometric scale. The authors introduce the differences between near-field optics and far-field optics from both an experimental and theoretical perspective. The book touches on a wide range of topics in near-field optics, and can be used both by the novice and experienced researcher already familiar with the subject, to connect the experimental with the theoretical aspects of near-field optics.

Inhalt

1. Introduction.- 1.1. Near-Field Optics and Photonics.- 1.2. Ultra-High-Resolution Near-Field Optical Microscopy (NOM).- 1.3. General Features of Optical Near-Field Problems.- 1.4. Theoretical Treatment of Optical Near-Field Problems.- 1.5. Remarks on Near-Field Optics and Outline of This Book.- 1.6. References.- 2. Principles of Near-Field Optical Microscopy.- 2.1. An Example of Near-Field Optical Microscopy.- 2.2. Construction of the NOM System.- 2.3. Theoretical Description of Near-Field Optical Microscopy.- 2.4. Near-Field Problems and the Tunneling Process.- 2.5. References.- 3. Instrumentation.- 3.1. Basic Systems of a Near-Field Optical Microscope.- 3.2. Light Sources.- 3.3. Light Detection and Signal Amplification.- 3.4. References.- 4. Fabrication of Probes.- 4.1. Sharpening of Fibers by Chemical Etching.- 4.2. Metal Coating and Fabrication of a Protruded Probe.- 4.3. Other Novel Probes.- 4.4. References.- 5. Imaging Experiments.- 5.1. Basic Features of the Localized Evanescent Field.- 5.2. Imaging Biological Samples.- 5.3. Spatial Power Spectral Analysis of the NOM Image.- 5.4. References.- 6. Diagnostics and Spectroscopy of Photonic Devices and Materials.- 6.1. Diagnosing a Dielectric Optical Waveguide.- 6.2. Spatially Resolved Spectroscopy of Lateral pn Junctions in Silicon-Doped Gallium Arsenide.- 6.3. Photoluminescence Spectroscopy of a Semiconductor Quantum Dot.- 6.4. Imaging of Other Materials.- 6.5. References.- 7. Fabrication and Manipulation.- 7.1. Fabrication of Photonic Devices.- 7.2. Manipulating Atoms.- 7.3. References.- 8. Optical Near-Field Theory.- 8.1. Introduction.- 8.2. Electromagnetic Theory as the Basis of Treating Near-Field Problems.- 8.3. Optical Near-Field Theory as an Electromagnetic Scattering Problem.- 8.4. Diffraction Theory inNear-Field Optics.- 8.5. Intuitive Model of Optical Near-Field Processes.- 8.6. References.- 9. Theoretical Description of Near-Field Optical Microscope.- 9.1. Electromagnetic Processes Involved in the Near-Field Optical Microscope.- 9.2. Representation of the Electromagnetic Field and the Interaction Propagator.- 9.3. States of Vector Fields and Their Representations.- 9.4. Angular Spectrum Representation of Electromagnetic Interactions.- 9.5. Near-Field Interaction of Dielectric Spheres Near a Planar Dielectric Surface.- 9.6. References.