Novel Structural Polycrystalline Silicon Thin Film Transistor

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Geliefert zwischen Do., 29.01.2026 und Fr., 30.01.2026

Details

This thesis is mainly surveyed the characteristics of polycrystalline silicon thin film transistor (TFT) putting forward and probing into four kinds of novel buried-oxide structures. With these structures, we can improve the shortcoming of the traditional polycrystalline silicon TFT, like leakage current (On/Off state current), subthreshold swing, floating body effect (kink effect), self-heating effect, and short channel effect etc.. Novel buried-oxide polysilicon thin-film transistors (poly-Si TFTs) are proposed and demonstrated to be superior to their conventional counterparts. Furthermore, these novel structures are simple to fabricate, practical, and completely compatible on CMOS technology. Otherwise, the poly-Si TFT with/without NH3 annealing and body implantation, and their corresponding effects, have also been investigated and discussed in depth.

Autorentext

Dr. Kuo-Dong Huang was born in Taiwan, R.O.C. His study involved in single electron device, silicon-on-insulator (SOI) and polycrystalline silicon thin-film transistor (TFT) devices with novel structures for high-integrated and low-power developments.


Klappentext

This thesis is mainly surveyed the characteristicsof polycrystalline silicon thin film transistor (TFT) putting forward and probing into four kinds of novel buried-oxide structures. With these structures,we can improve the shortcoming of the traditional polycrystalline silicon TFT, like leakage current (On/Off state current), subthreshold swing, floating body effect (kink effect), self-heating effect, and short channel effect etc.. Novel buried-oxide polysilicon thin-film transistors (poly-Si TFTs) are proposed and demonstrated to be superior to their conventional counterparts. Furthermore, these novel structures are simple to fabricate, practical, and completely compatible on CMOS technology. Otherwise, the poly-Si TFT with/without NH3 annealing and body implantation, and their corresponding effects, have also been investigated and discussed in depth.

Weitere Informationen

  • Allgemeine Informationen
    • GTIN 09783639129878
    • Sprache Englisch
    • Genre Technik
    • Anzahl Seiten 192
    • Größe H220mm x B150mm x T12mm
    • Jahr 2011
    • EAN 9783639129878
    • Format Kartonierter Einband (Kt)
    • ISBN 978-3-639-12987-8
    • Titel Novel Structural Polycrystalline Silicon Thin Film Transistor
    • Autor Kuo-Dong Huang
    • Untertitel Fabrication and Characterization of Polycrystalline Silicon Thin Film Transistor with Buried Insulator
    • Gewicht 308g
    • Herausgeber VDM Verlag

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