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Phase-Shift Mask
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Geliefert zwischen Di., 03.02.2026 und Mi., 04.02.2026
Details
Please note that the content of this book primarily consists of articles available from Wikipedia or other free sources online. Phase-shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography. There exist alternating and attenuated phase shift masks. A conventional photomask is a transparent plate with the same thickness everywhere, parts of which are covered with non-transmitting material in order to create a pattern on the semiconductor wafer when illuminated. In alternating phase-shift masks, certain transmitting regions are made thinner or thicker. That induces a phase-shift in the light traveling through those regions of the mask (see the illustration on the left). When the thickness is suitably chosen, the interference of the phase-shifted light with the light coming from unmodified regions of the mask has the effect of improving the contrast on some parts of the wafer, which may ultimately increase the resolution on the wafer.
Weitere Informationen
- Allgemeine Informationen
- GTIN 09786130929657
- Editor Lambert M. Surhone, Miriam T. Timpledon, Susan F. Marseken
- Genre Technik
- Anzahl Seiten 88
- Größe H220mm x B220mm
- EAN 9786130929657
- Format Fachbuch
- Titel Phase-Shift Mask
- Herausgeber Betascript Publishing
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