Photoresist Technology in Microsystems: Principles, Processes and Applications

This book presents a comprehensive overview of recent advances in photoresist technology, a cornerstone of modern microfabrication. Photoresists enable the precise patterning essential for creating microelectronic devices, MEMS, biomedical systems, and photonic components. As the demand for smaller, faster, and more efficient microsystems grows, the role of photoresists in achieving high-resolution patterning and complex 3D structures has become increasingly critical. However, despite its importance, there is a lack of comprehensive resources that bridge the gap between the fundamental principles of photoresist chemistry, advanced fabrication techniques, and their diverse applications. This book addresses this gap by providing a unified and up to-date exploration of photoresist technology, making it a timely and essential contribution to the field. The book balances theoretical depth with practical insights, making it accessible to readers with varying levels of expertise. The book is designed to cater to a broad audience, from students and researchers to industry professionals. A unique feature of this book is its emphasis on the interplay between material properties, processing techniques, and application-specific requirements.

Covers comprehensive aspects of photoresist technology in microsystems, from fundamentals to advanced applications Explains complex photoresist chemistry and processing techniques in an accessible manner for engineers and researchers Introduces emerging trends and future directions, keeping readers at the forefront of technological advancements

Autorentext

Prof. Kaiying Wang received his PhD in condensed matter physics from the Institute of Physics, Chinese Academy of Sciences. He joined University of South-Eastern Norway (USN) in 2007 as an associate professor and was promoted to professor in 2010. His research interests focus on micro-fabrication and nanotechnology, electrochemistry, photochemistry and nanodevices for environment and energy applications.

For teaching, he has taught the microfabrication (MFA4000, master) and Nanotechnology (TSE3120, bachelor) at University of South-eastern Norway from year 2010. Meanwhile, he has participated in several national and European projects related to the micro/nano fabrication technology. The related education programmes at USN include: (1) Sensor Systems and Innovation (2) Smart Systems Integrated Solutions (3) Micro- and Nano Systems Technology.

Inhalt

1. Introduction to Photoresist Technology.- 2. Fundamentals of Photoresist Chemistry.- 3. Microsystems Fabrication Processes.- 4. Advanced Photoresist Materials for Microsystems.- 5. Photoresist Processing Techniques.- 6. Photoresist Applications in Microsystems.- 7. High-Aspect-Ratio Lithography for Microsystems.- 8. Challenges in Photoresist Technology for Microsystems.- 9. Emerging Trends in Photoresist Technology.- 10. Future Perspectives.