Plasma Synthesis of Carbon Films

The aim of this work was to use plasma processes to deposit thin carbon films on certain substrates (glass, silicon and FTO-coated glass) and then corrode them in SF6 plasma combined with H2, O2 and Ar in order to increase the roughness and consequently the contact area of these films with the electrolyte of a dye-sensitized solar cell (DSSC). The films produced were characterized and studied using profilometry, SEM, XRD, XPS, AFM, RAMAN, FTIR, goniometry and 4-point sheet resistance measurements. These analyses showed that the films that underwent the plasma texturing process obtained a characteristic nano-structural pattern for each combination of gases used. The goniometry analysis showed that TT made the deposited films hydrophobic. However, after subjecting them to the plasma texturizing process, they became super hydrophilic. These results (increased roughness and hydrophilicity) are of great importance for the application of these films as counter electrodes for DSSCs.

Autorentext

Sie hat einen Abschluss in Physik von der Bundesuniversität Espírito Santo und einen Master-Abschluss in Physik vom Technologischen Institut für Luft- und Raumfahrt. Sie verfügt über Fachwissen in den folgenden Bereichen: Synthese und Behandlung von Materialien mit Hilfe von Plasmaprozessen, kohlenstoffhaltige Materialien, Titandioxid, Charakterisierung von Materialien und Farbstoffsolarzellen.