Process development for nanostructuring and 3D micro/nanointegration

Micro- and Nanostructures significantly influence the physical and chemical properties of surfaces. Therefore, such structures can be used to functionalize surfaces and adjust the surface properties to the specific requirements of a certain application. A remaining challenge is the integration of functional structures into micro devices to achieve e.g. patterning in 3D, 3D surface structures and sidewall patterning. This work is focused on the development of processes to achieve both, the accurate replication of micro and nanostructures as well as the integration of functional surface structures into micro devices.

Autorentext

Tobias Senn studied Microsystem technology at the University of Freiburg with the focus on materials and processes. He received his PhD from the Technical University of Berlin in 2012. His work is focused on the development of processes for 3D micro/nanointegration.