Surface Chemical Functionalization based on Plasma Techniques

A Plasma Enhanced Chemical Vapour Deposition (PECVD) technique is used to polymerize Acryilic Acid for the surface functionalization of porous silicon samples with different pore dimensions. The formed polymer show free COOH groups also at the pores inner surface, suitable for the immobilization of fluorescent labelled Protein A. The stability of the polymer and its role in the protection from aging of the porous matrix have been chracterised by ATR-FTIR, SEM, Optical Contact Angle and Fluorecence Microscopy. The polymerization process is well controllable and suitable for the functionalization of porous silicon leaving free carboxylic groups at the surface ready for the immobilization of biochemical species in sensing application

Autorentext

Serena Ricciardi was born in Naples on August, 27th 1984. She graduated in Industrial Biotecnologies with 110/110 summa cum laude at the University of Torino in December 2008. In January 2012, she has defended her PhD in "Electronic Devices" at the Physics Department of Politecnico of Torino.