X-Ray Photoelectron Spectroscopy

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High Quality Content by WIKIPEDIA articles! X-ray photoelectron spectroscopy (XPS) is a quantitative spectroscopic technique that measures the elemental composition, empirical formula, chemical state and electronic state of the elements that exist within a material. XPS spectra are obtained by irradiating a material with a beam of X-rays while simultaneously measuring the kinetic energy (KE) and number of electrons that escape from the top 1 to 10 nm of the material being analyzed. XPS requires ultra high vacuum (UHV) conditions. XPS is a surface chemical analysis technique that can be used to analyze the surface chemistry of a material in its "as received" state, or after some treatment, for example: fracturing, cutting or scraping in air or UHV to expose the bulk chemistry, ion beam etching to clean off some of the surface contamination, exposure to heat to study the changes due to heating, exposure to reactive gases or solutions, exposure to ion beam implant, exposure to ultraviolet light.

Weitere Informationen

  • Allgemeine Informationen
    • GTIN 09786130574314
    • Editor Lambert M. Surhone, Miriam T. Timpledon, Susan F. Marseken
    • Genre Technik
    • EAN 9786130574314
    • Format Fachbuch
    • Titel X-Ray Photoelectron Spectroscopy
    • Herausgeber Betascript Publishing
    • Anzahl Seiten 144

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